吉林大学学报(工学版) ›› 2011, Vol. 41 ›› Issue (03): 791-794.

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Effect of reactive ion etching process on simulation of polymeric arrayed waveguide grating multiplexers

QIN Zheng-kun1,2,HE Fei1,LIU Chun-ling1,MA Chun-sheng2   

  1. 1.College of Information Tecchnology,Jinlin Normal University,Siping 136000,China;2.State Key Laboratory on Integrated Optoelectronics,Jilin University,Changchun 130012,China
  • Received:2009-12-15 Online:2011-05-01 Published:2011-05-01

Abstract:

A polymer Arrayed Waveguide Grating (AWG) multiplexer has been designed and fabricated by using the poly (2, 3, 4, 5, 6-pentafluorostyrene-co-glycidylmethacrylate) (PFS-co-GMA). In the fabrication of the polymeric AWG device, the cross of the channels and the arrayed waveguides exhibit smooth trapezoid crosssections instead of originally designed rectangular ones after the reactive ion etching. In this paper, for the technological level and the characteristics of the trapezoid cross-sections, a new analysis method, referred as equivalent energy flow method, is presented for analyzing the transmission characteristics of AWG. The central wavelength of the device originally designed is 1 550.918 nm, and the measured central wavelength is 1 550.826 nm, the spectral shift is 0.092 nm. By using this technique, the computed results show that the spectral shift is 1 550.872 nm, the spectral shift is reduced to 0.046 nm. This indicates that the proposed equivalent energy flow method has satisfactory accuracy and reasonability

Key words: optoelectronics technology, integrated optics, arrayed waveguied grating(AWG), spectral shift, trapezoid crosssections, equivalent energy flow

CLC Number: 

  • TN252
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