Abstract: Iron nitride films were deposited on glass substrate by DC magnetron sputtering with mixed Ar／N2 as discharge (N2 fraction of 5％) and at different time ( 30 min , 20 min , 10 min , and 5 min , respectively ) . The composition of the films was analyzed by means of X-ray photoelectron spectroscopy experiment (XPS) . The layer phases and the surface morphologies of the films were characterized with the aid of grazing incidence X-ray scattering and X-ray diffraction as well as atomic force microscopy . For the film grown at N2 fraction of 5 ％ , the phase of FeN_0.056appeared . The surface of the films showed the selfaffine character . The values of roughness exponent α≈ 0.65 and growth exponent β≈ 0.53 are in agreement with the improvised KPZ exponents based on Kolmogorov's energy cascade concept .

Key words: Fe_xN film, DC magnetron sputtering, growth mechanism