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The Behavior of Crystalline Grain Growth in TiNi Shape Memory Alloy Thin Films

MENG Fan ling1, LI Yong hua2, LIU Chang sheng1, XU Yue3, WANG Yu ming4   

  1. 1. School of Materials and Metallurgy, Northeastern University, Shenyang 110004, China;2. School of Sciences, Harbin Engineering University, Harbin 150001, China;3. Test Science Experiment Center, Jilin University, Changchun 130021, China;4. College of Materials Science and Engineering, Jilin University, Changchun 130012, China
  • Received:2007-12-11 Revised:1900-01-01 Online:2008-05-26 Published:2008-05-26
  • Contact: LI Yong hua

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Abstract: NiTi thin films were deposited on glass substrate by d.c. magnetron sputtering. X-ray diffraction (XRD) and small-angle X-ray scattering (SAXS) were used to study the behavior of crystalline grain growth in TiNi alloy thin films annealed at 500 ℃. The thin films were deposited at room temperature.

Key words: NiTi thin film, crystalline gain, small-angle X-ray scattering

CLC Number: 

  • TG111.5
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