J4 ›› 2011, Vol. 49 ›› Issue (02): 358-362.

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Photodegradation of Dimethyl Phthalate by UV-Fenton System

JING Weiwen, BAO Xiao |wei, CHEN Yanqin, YANG Zailei, LIU Yang   

  1. College of Chemical Engineering, Xinjiang Agricultural University, Urumqi 830052, China
  • Received:2010-05-25 Online:2011-03-26 Published:2011-06-14
  • Contact: JING Weiwen E-mail:479218061@qq.com

Abstract:

The photochemical degradation of dimethyl phthalate(DMP) in aqueous solution was investigated via a comparative assessment in vario
us advanced oxidation systems (UV, H2O2, UV/H2O2, UV/Fe2+, Fenton and UV/Fenton). The degradation trends followed the following order: UV/Fenton>UV/H2O2>dark/Fenton>UV/Fe2+>UV>H2O2. It could be inferred from the studies that UV radiation enhanced the removal rate of DMP in the Fenton process and UV/Fenton was the most effective for the decomposition of DMP. According to the experimental result, the concentrations of Fe2+ and H2O2 and pH value were the three main factors that could greatly influence the degradation rate of DMP, and the effect of the factors followed the order: pH value>H2O2 concentration>Fe2+ concentration. The optimum conditions were obtained by orthogonal experiment at initial pH=3—4 for the UVFenton system, with original Fe2+ and H2O2 concentrations of 3.6×10-4—7.2×10-4 mol/L and 1.9×10-2 mol/L, respectively.

Key words: UV-Fenton method, dimethyl phthalate(DMP), photodeg

CLC Number: 

  • X132