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A XPS Study of the Giant Magnetoresistant Multilayers of the Cu/Fe

ZHENG Da-fang1, TONG Fu-qiang2, ZHANG Wei3, G E Xin4, CHEN Xu4   

  1. 1. Measurement and Testing Center, Jilin University, Changchun 130023, China;2. State Key United Laboratory on Integrated Optoelectron, Jilin University, Changchun 130023, China;3. College of Information Engineering and Science, Yangtze University, Wuxi 214063, China;4. College of Materials Science and Engineering, Jilin University, Changchun 130023, China
  • Received:2002-06-23 Revised:1900-01-01 Online:2003-01-26 Published:2003-01-26
  • Contact: ZHENG Da-fang

Abstract: The Cu/Fe multilayer on Si substrate was prepared by the magnetron sputtering method. The samples have been studied by X-ray photoelectron spectroscopy (XPS). With the sputtering depth increasing, the alloying forms on the interface of Cu/Fe.

Key words: Cu/Fe multilayers, magnetron sputtering, alloying, char acterisation analysis

CLC Number: 

  • TG146.1