溅射于NiMnCo上的TiO2薄膜的结构与相变

溅射于NiMnCo上的TiO₂薄膜的结构与相变

顾广瑞¹, 李哲奎¹, 林景波¹, 李全军¹, 郑伟涛², 赵永年³, 金曾孙³

1. 延边大学理工学院, 吉林省延吉 133002; 2. 吉林大学材料科学与工程学院，长春 130012; 3. 吉林大学超硬材料国家重点实验室, 长春 130012

收稿日期:2004-11-17 修回日期:1900-01-01 出版日期:2005-07-26
通讯作者: 顾广瑞

Structure and Phase Change of TiO₂ Films Sputtered on NiMnCo Substrates

GU Guang-rui¹, LI Zhe-kui¹, LIN Jing-bo¹ , LI Quan-jun¹,ZHENG Wei-tao², ZHAO Yong-nian³, JIN Zeng-sun³

1. College of Science and Engineering, Yanbian University, Yanji 133002, Jinlin Province, China;2. College of Materials Science and Engineering, Jilin University, Changchun 130012, China; 3. National Laboratory for Superhard Materials, Jilin University, Changchun 130012, China

Received:2004-11-17 Revised:1900-01-01 Online:2005-07-26
Contact: GU Guang-rui

摘要/Abstract

摘要： 利用射频磁控溅射方法以纯金属钛做靶材在氩氧混合气体中制备了TiO₂薄膜. X射线衍射结果表明, 在NiMnCo合金基底上成功地沉积了具有金红石、金红石/锐钛矿和锐钛矿结构的TiO₂薄膜, 工作气压从0.2 Pa变化到2 Pa, TiO₂薄膜的结构由金红石相变到锐钛矿相. 低于600 nm时, 厚度对T iO₂薄膜结构没有明显影响.

关键词: TiO₂薄膜, XRD光谱, 金红石, 锐钛矿

Abstract: Titainum dioxide (TiO₂) films have been successfully deposited on NiMnCo substrates via radio-frequency (RF) magnetron react ive sputtering with pure Ti(99.99%) as the target and Ar mixed with O₂ as reactive gas. The effects of total gas pressure on the structure and phas e transition of TiO₂ films were studied by means of XRD spectra. It i s indicated that the film structure changes from rutile to anatase while work to tal gas pressure changes from 0.2 Pa to 2 Pa. The structure of TiO₂ f ilms is not affected by the film thickness.

Key words: TiO₂ film, XRD spectrum, rutile, anatase

中图分类号:

O647.2

顾广瑞, 李哲奎, 林景波, 李全军, 郑伟涛, 赵永年, 金曾孙. 溅射于NiMnCo上的TiO₂薄膜的结构与相变[J]. J4, 2005, 43(04): 517-520.

GU Guang-rui, LI Zhe-kui, LIN Jing-bo , LI Quan-jun,ZHENG Wei-tao, ZHAO Yong-nian, JIN Zeng-sun. Structure and Phase Change of TiO₂ Films Sputtered on NiMnCo Substrates[J]. J4, 2005, 43(04): 517-520.

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溅射于NiMnCo上的TiO₂薄膜的结构与相变

Structure and Phase Change of TiO₂ Films Sputtered on NiMnCo Substrates

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