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金刚石膜制备工艺对其应力-应变特性的影响

白亦真1,2, 吕宪义3, 韩雪梅3, 金曾孙3, 吕天山4, 白媛5   

  1. 1. 大连理工大学 三束材料改性国家重点实验室, 辽宁省 大连 116023; 2. 大连理工大学 物理系, 辽宁省 大连 116023; 3. 吉林大学 超硬材料国家重点实验室, 长春 130012; 4. 长春工业大学 工商管理学院, 长春 130012; 5. 辽宁工学院 计算机科学与工程学院, 辽宁省 锦州 121000
  • 收稿日期:2005-11-24 修回日期:1900-01-01 出版日期:2006-09-26 发布日期:2006-09-26
  • 通讯作者: 吕宪义

Influences of Deposition Technologies on Stress-strain Properties of Thick Diamond Films

BAI Yi zhen1,2, LV Xian yi3, HAN Xue mei3, JIN Zeng sun3, LV Tian shan4, BAI Yuan5   

  1. 1.State Key Laboratory of Materials Modification by Laser, Ion and Electron Beams, Dalian University of Technology,Dalian 116023,Liaoning Province,China; 2.Department of Physics,Dalian University of Technology,Dalian 116023,Liaoning Province,China;3.State Key Laboratory of Superhard Materials,Jilin University,Changchun 130012,China;4.School of Business Administration, Changchun University of Technology,Changchun 130012,China;
  • Received:2005-11-24 Revised:1900-01-01 Online:2006-09-26 Published:2006-09-26
  • Contact: LV Xian yi

摘要: 研究了在直流热阴极辉光放电等离子体化学气相沉积制备金刚石厚膜的工艺过程中, 放电电流和甲烷浓度对金刚石膜应力-应变特性的影响规律. 

关键词: 化学气相沉积, 金刚石膜, 应力-应变

Abstract: This paper focuses on the influences of the discharge current and methane concentration on the stress-strain properties of Chemical Vapor Deposition (CVD) thick diamond films. This has laid good foundations for the promotions of the qualities, especially the mechanical properties of thick diamond films.

Key words: chemical vapor deposition, diamond films, stress-strain 

中图分类号: 

  • O484.5