TiNi形状记忆合金薄膜结晶粒子的长大行为

TiNi形状记忆合金薄膜结晶粒子的长大行为

孟繁玲¹, 李永华², 刘常升¹, 徐跃³, 王煜明⁴

1. 东北大学材料与冶金学院, 沈阳 110004; 2. 哈尔滨工程大学理学院, 哈尔滨 150001; 3. 吉林大学测试科学实验中心, 长春 130021; 4. 吉林大学材料科学与工程学院, 长春 130012

收稿日期:2007-12-11 修回日期:1900-01-01 出版日期:2008-05-26 发布日期:2008-05-26
通讯作者: 李永华

The Behavior of Crystalline Grain Growth in TiNi Shape Memory Alloy Thin Films

MENG Fan ling¹, LI Yong hua², LIU Chang sheng¹, XU Yue³, WANG Yu ming⁴

1. School of Materials and Metallurgy, Northeastern University, Shenyang 110004, China;2. School of Sciences, Harbin Engineering University, Harbin 150001, China;3. Test Science Experiment Center, Jilin University, Changchun 130021, China;4. College of Materials Science and Engineering, Jilin University, Changchun 130012, China

Received:2007-12-11 Revised:1900-01-01 Online:2008-05-26 Published:2008-05-26
Contact: LI Yong hua

摘要/Abstract

摘要： 将采用直流磁控溅射方法制备的TiNi薄膜沉积在玻璃衬底上, 在退火温度为500 ℃时, 应用X射线衍射（XRD）和小角X射线散射（SAXS）研究室温溅射的TiNi合金薄膜结晶粒子的长大行为. 结果表明, 薄膜中的晶化粒子约在前13 min以成核的方式生成, 而在13 min后不断长大, R₃G与退火时间t的关系不完全满足Lifshitz’s动力学理论. 

关键词: TiNi薄膜, 结晶粒子, 小角X射线散射

Abstract: NiTi thin films were deposited on glass substrate by d.c. magnetron sputtering. X-ray diffraction (XRD) and small-angle X-ray scattering (SAXS) were used to study the behavior of crystalline grain growth in TiNi alloy thin films annealed at 500 ℃. The thin films were deposited at room temperature.

Key words: NiTi thin film, crystalline gain, small-angle X-ray scattering

中图分类号:

TG111.5

孟繁玲, 李永华, 刘常升, 徐跃, 王煜明. TiNi形状记忆合金薄膜结晶粒子的长大行为[J]. J4, 2008, 46(03): 531-534.

MENG Fan ling, LI Yong hua, LIU Chang sheng, XU Yue, WANG Yu ming. The Behavior of Crystalline Grain Growth in TiNi Shape Memory Alloy Thin Films[J]. J4, 2008, 46(03): 531-534.

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