对靶磁控溅射FeCoN薄膜的结构与磁性

J4 ›› 2011, Vol. 49 ›› Issue (01): 125-130.

对靶磁控溅射FeCoN薄膜的结构与磁性

贾辉^1,2, 韩莉¹, 孙淑晶¹, 孙光东³, 赵翠梅², 王欣^2

1. 北华大学物理学院, 吉林吉林 132013|2. 吉林大学材料科学与工程学院, 长春 130012; 3. 惠州学院电子系, 广东惠州 516007

收稿日期:2010-01-27 出版日期:2011-01-26 发布日期:2011-02-19
通讯作者: 王欣 E-mail:wang_xin@jlu.edu.cn

Structural and Magnetic Properties of FeCoN Thin Film Deposited by Facing-Target Magnetron Sputtering

JIA Hui^1,2, HAN Li¹, SUN Shu jing¹, SUN Guang dong³, ZHAO Cui mei², |WANG Xin^2

1. College of Physics, |Beihua |University, |Jilin |132013, Jilin Province, |China;2. College of Materials Science and Engineering, Jilin University, |Changchun |130012, China; 3. |Department of Electronics, Huizhou College, Huizhou 516007, Guangdong Province, |China

Received:2010-01-27 Online:2011-01-26 Published:2011-02-19
Contact: WANG Xin E-mail:wang_xin@jlu.edu.cn

摘要/Abstract

摘要：

利用改进后的对靶磁控溅射系统, 以N₂/Ar混合气体为溅射气体, 在未加热的Si(111)衬底上沉积FeCoN薄膜. 采用X射线衍射仪(XRD)、透射电子显微镜(TEM)、扫描电子显微镜(SEM)和超导量子干涉仪(SQUID)研究不同Co靶溅射功率对FeCoN薄膜样品的结构、形貌和磁性性能的影响. 结果表明: 固定Fe靶功率为160 W(电流I=0.4 A), 当Co靶功率为2.4 W(I=0.04 A)时, 薄膜由Co溶入ε-Fe₃N中形成的ε-(Fe,Co)₃N化合物相构成; 当Co靶功率为58 W(I=0.2 A)时, 获得了Fe₃N/Co₃N化合物相, 薄膜的饱和磁化强度(M_s)为151.47 A·m²/kg, 矫顽力(H_c)为3.68 kA/m; 当Co靶功率为11.9 W(I=0.07 A)时, 制备出具有高饱和磁化强度的α″-(Fe,Co)₁₆N₂化合物相, 薄膜的M_s=265.08 A·m²/kg, H_c=8.24 kA/m. 

关键词: FeCoN薄膜, α″-(Fe,Co)₁₆N₂, 饱和磁化强度, 矫顽力

Abstract:

Fe-Co-N films were deposited on an unheated Si (111) substrate by means of developed facing\|target magnetron sputtering with N₂/Ar as sputtering gas. The effect of various Co target power on the structure, morphology and magnetic properties of FeCoN films were investigated by X-ray diffraction (XRD), transmission electron microscopy (TEM), scanning electron microscopy (SEM) and superconducting quantum interference device (SQUID), respectively. The results show that when the input power on Fe target was 160 W and Co target power was 2.4 W, the thin films with ε-(Fe,Co)₃N were synthesized; when Co target power was 58 W, paramagnetic Co₃N phase appeared with ferromagnetic phase Fe₃N, saturation magnetization (M_s) of thin film is 151.47 A·m²/kg, coercivity (H_c) is 3.68 kA/m. When Co target power was 11.9 W (I=0.07 A),
α″-Fe,Co)₁₆N₂phase was obtained with a high M_sof 265.08 A·m²/kg and H_c of 8.24 kA/m.

Key words: FeCoN thin film, α″-Fe₁₆N₂, saturation magnetization, coercivity

中图分类号:

TB303

贾辉, 韩莉, 孙淑晶, 孙光东, 赵翠梅, 王欣. 对靶磁控溅射FeCoN薄膜的结构与磁性[J]. J4, 2011, 49(01): 125-130.

GU Hui, HAN Chi, SUN Chu-Jing, SUN Guang-Dong, DIAO Cui-Mei, WANG Xin-. Structural and Magnetic Properties of FeCoN Thin Film Deposited by Facing-Target Magnetron Sputtering[J]. J4, 2011, 49(01): 125-130.

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