衬底温度对NiTi薄膜晶化温度的影响

衬底温度对NiTi薄膜晶化温度的影响

陶艳春¹, 李永华², 徐跃³, 孟繁玲⁴, 郑伟涛⁴, 邵振杰⁴, 赵江⁴

1.吉林大学化学学院超分子结构国家重点实验室, 长春 130012; 2. 东北大学秦皇岛分校基础部, 河北省秦皇岛 066004;3.吉林大学测试科学试验中心, 长春 130023; 4.吉林大学材料科学与工程学院材料科学系, 长春 130012

收稿日期:2004-06-15 修回日期:1900-01-01 出版日期:2005-03-26 发布日期:2005-03-26
通讯作者: 孟繁玲

Effect of Substrate Temperature on Crystallization Temperature of NiTi Thin Films

TAO Yan-chun¹, LI Yong-hua², XU Yue³, MENG Fan-ling⁴, ZHENG Wei-tao⁴, SHAO Zhen-jie⁴, ZHAO Jiang⁴

1. Key Laboratory for Supramolecular Structure and Materials, College of Chemistry, Jilin University, Changchun 130012, China; 2. Division of Basic Courses, Northeastern University at Qinhuangdao, Qinhuangdao 066004, Hebei Province, China; 3. Test Science Experiment Center, Jilin University, Changchun 130023, China; 4. Department of Materials Science, College of Material Science and Engineering, Jilin University, Changchun 130012, China

Received:2004-06-15 Revised:1900-01-01 Online:2005-03-26 Published:2005-03-26
Contact: MENG Fan-ling

摘要/Abstract

摘要： 采用直流磁控溅射方法, 制备出沉积在不同温度衬底上的NiTi薄膜. 应用X射线衍射、小角X射线散射和差热扫描量热法研究了两种衬底温度(室温和573 K)溅射的NiTi合金薄膜晶化温度和在763 K退火1 h的晶化程度.

关键词: NiTi薄膜, 晶化温度, 差热扫描量热法

Abstract: NiTi thin films were deposited on different substrates at room temperature and 573 K, respectively by means of D.C. magnetron sputtering. X-ray diffraction, small-angle X-ray scattering and differential scanning calorimetery were used to study the crystalline characteristics and the crystall ization temperature of NiTi thin films and the crystallinity of the NiTi thin film annealed at 763 K for 1 h.

Key words: NiTi thin film, crystallization temperature, differential scanning calorimetery

中图分类号:

O484.4

陶艳春, 李永华, 徐跃, 孟繁玲, 郑伟涛, 邵振杰, 赵江. 衬底温度对NiTi薄膜晶化温度的影响[J]. J4, 2005, 43(02): 197-200.

TAO Yan-chun, LI Yong-hua, XU Yue, MENG Fan-ling, ZHENG Wei-tao, SHAO Zhen-jie, ZHAO Jiang. Effect of Substrate Temperature on Crystallization Temperature of NiTi Thin Films[J]. J4, 2005, 43(02): 197-200.

[1]	田惠博, 张强, 闫岩, 赵淑华, 王丽丽, 王欣, 孙德烨. Ag/石墨烯复合涂层的制备及抗菌性能[J]. 吉林大学学报(理学版), 2020, 58(2): 403-409.
[2]	王健, 白亦真, 张东, 潘丽, 柳浩, 管昌雨, 吴占玲, 赵纪军. 用不同靶材制备B\\|C\\|N薄膜及其红外表征[J]. J4, 2010, 48(06): 1027-1030.
[3]	李启源, 魏长平, 孙小飞. 退火温度对ZnO/SiO₂复合薄膜结构及光学性能的影响[J]. J4, 2010, 48(03): 478-481.
[4]	于书坤, 范昭奇, 夏道成, 程传辉 \| 白青龙, 杜国同. 用椭圆偏振光谱法研究取代基对酞菁薄膜光学常数的影响[J]. J4, 2009, 47(6): 1277-1281.
[5]	廖燕平, 黄金英, 郜峰利,4, 邵喜斌, 付国柱, 荆海，缪国庆. 激光晶化多晶硅的制备与XRD谱[J]. J4, 2004, 42(01): 99-102.