J4 ›› 2011, Vol. 49 ›› Issue (02): 358-362.

• 环境科学 • 上一篇    

用光助Fenton体系降解邻苯二甲酸二甲酯

景伟文, 包晓玮, 陈燕勤, 杨再磊, 刘洋   

  1. 新疆农业大学 化学工程学院, 乌鲁木齐 830052
  • 收稿日期:2010-05-25 出版日期:2011-03-26 发布日期:2011-06-14
  • 通讯作者: 景伟文 E-mail:479218061@qq.com

Photodegradation of Dimethyl Phthalate by UV-Fenton System

JING Weiwen, BAO Xiao |wei, CHEN Yanqin, YANG Zailei, LIU Yang   

  1. College of Chemical Engineering, Xinjiang Agricultural University, Urumqi 830052, China
  • Received:2010-05-25 Online:2011-03-26 Published:2011-06-14
  • Contact: JING Weiwen E-mail:479218061@qq.com

摘要:

利用几种不同的氧化体系对水溶液中的邻苯二甲酸二甲酯(DMP)进行光化学降解. 结果表明: 降解效率依次为: UV/Fenton>UV/H2O2>无光Fenton >UV/Fe2+>UV>H2O2; 紫外光与Fenton体系之间存在协同效应; UV/Fenton体系是高效的降解体系; pH值、 H2O2浓度、 Fe2+浓度是光化学降解的重要影响因素, 各因素的重要性顺序为: pH值>H2O2浓度>Fe2+浓度; 正交实验确定适宜的降解条件为: 初始pH=3~4, Fe2+浓度为3.6×10-4~7.2×10-4 mol/L, H2O2浓度为1.9×10-2 mol/L.

关键词: UV-Fenton法; 邻苯二甲酸二甲酯; 光降解

Abstract:

The photochemical degradation of dimethyl phthalate(DMP) in aqueous solution was investigated via a comparative assessment in vario
us advanced oxidation systems (UV, H2O2, UV/H2O2, UV/Fe2+, Fenton and UV/Fenton). The degradation trends followed the following order: UV/Fenton>UV/H2O2>dark/Fenton>UV/Fe2+>UV>H2O2. It could be inferred from the studies that UV radiation enhanced the removal rate of DMP in the Fenton process and UV/Fenton was the most effective for the decomposition of DMP. According to the experimental result, the concentrations of Fe2+ and H2O2 and pH value were the three main factors that could greatly influence the degradation rate of DMP, and the effect of the factors followed the order: pH value>H2O2 concentration>Fe2+ concentration. The optimum conditions were obtained by orthogonal experiment at initial pH=3—4 for the UVFenton system, with original Fe2+ and H2O2 concentrations of 3.6×10-4—7.2×10-4 mol/L and 1.9×10-2 mol/L, respectively.

Key words: UV-Fenton method, dimethyl phthalate(DMP), photodeg

中图分类号: 

  • X132