Abstract: The present paper presents the dependence of the conduc tivity of TiO₂ thin films on the different substrates and on the thick ness of the films. It was found that the resistivity of the TiO₂ thin films de posited on Ti and Si substrates increased non-linearly with the increase of the thickness of the films and varied in the range from conductor or semiconductor to nonconductor, respectively. The conducting layer thickness of the films deposited on diff erent substarte materials is different and the films deposited on glass are nonc onductors. This is attributed to interface electrons transfer, and the conducting layer thickness is determined by the work function difference between substrates and thin films.

Key words: nanometer TiO₂ thin films, conductivity, transfer of electrons