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Effect of Substrate Temperature on Crystallization Temperature of NiTi Thin Films

TAO Yan-chun1, LI Yong-hua2, XU Yue3, MENG Fan-ling4, ZHENG Wei-tao4, SHAO Zhen-jie4, ZHAO Jiang4   

  1. 1. Key Laboratory for Supramolecular Structure and Materials, College of Chemistry, Jilin University, Changchun 130012, China; 2. Division of Basic Courses, Northeastern University at Qinhuangdao, Qinhuangdao 066004, Hebei Province, China; 3. Test Science Experiment Center, Jilin University, Changchun 130023, China; 4. Department of Materials Science, College of Material Science and Engineering, Jilin University, Changchun 130012, China
  • Received:2004-06-15 Revised:1900-01-01 Online:2005-03-26 Published:2005-03-26
  • Contact: MENG Fan-ling

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Abstract: NiTi thin films were deposited on different substrates at room temperature and 573 K, respectively by means of D.C. magnetron sputtering. X-ray diffraction, small-angle X-ray scattering and differential scanning calorimetery were used to study the crystalline characteristics and the crystall ization temperature of NiTi thin films and the crystallinity of the NiTi thin film annealed at 763 K for 1 h.

Key words: NiTi thin film, crystallization temperature, differential scanning calorimetery

CLC Number: 

  • O484.4
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