Abstract: Titainum dioxide (TiO₂) films have been successfully deposited on NiMnCo substrates via radio-frequency (RF) magnetron react ive sputtering with pure Ti(99.99%) as the target and Ar mixed with O₂ as reactive gas. The effects of total gas pressure on the structure and phas e transition of TiO₂ films were studied by means of XRD spectra. It i s indicated that the film structure changes from rutile to anatase while work to tal gas pressure changes from 0.2 Pa to 2 Pa. The structure of TiO₂ f ilms is not affected by the film thickness.

Key words: TiO₂ film, XRD spectrum, rutile, anatase