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Factors Affecting the Stability of Large Current Hot Cathode Glow Discharge

BAI Yi-zhen1, LV Xian-yi2, JIN Zeng-sun2, JIANG Zhi-gang2   

  1. 1. Department of Physics, Dalian University of Technology, Dalian 116023, Liaoning Province, China; 2. State Key Laboratory of Superhard Materials, Jilin University, Changchun 130012, China
  • Received:2005-03-22 Revised:1900-01-01 Online:2006-01-26 Published:2006-01-26
  • Contact: LV Xian-yi

Abstract: Large current hot cathode glow discharge was used for plasma chemical vapor deposition of diamond films. It improved deposition rate and films quality efficiently. Large current glow discharge has a strong tendency to transform to arc discharge. This paper focuses our attention on the factors affecting the stability of large current hot cathode glow discharge. The research results show that the cathode temperature, the cathode surface state and the size and place disposition between cathode and anode have influences on the stability of glow discharge, respectively.

Key words: hot cathode, glow discharge, stability

CLC Number: 

  • O461