J4

• 物理 • Previous Articles     Next Articles

Fabrication of High-quality Transparent ZnO/Diamond Heterojunction

YANG Jie1, TIAN Hong-zhi2, WANG Cheng-xin3   

  1. 1. Department of Foundation, Aviation University of Airforce, Changchun 130022, China; 2. Editorial Department of Journal of Jilin University (Information Science Edition), Changchun 130012, China; 3. School of Physics and Engineering, Zhongshan University, Guangzhou 510275, China
  • Received:2005-11-17 Revised:1900-01-01 Online:2006-05-26 Published:2006-05-26
  • Contact: YANG Jie

Abstract: The fabrication and characterization of high-quality transparent heterojunction between n-type ZnO film and p-type diamond single crystalline film on the substrate of diamond bulk single crystal are described. The results indicate that the current density of the fabricated p-n junction reaches 110 A/m2 when the forward bias voltage is 2.5 V, and the turn-on voltage value is about 0.75 V that are in agreement with the expected values. Moreover, the excellent rectification characteristic and transparentness in the visible light range were applied in the device.

Key words: ZnO, diamond, p-n junction, fabrication

CLC Number: 

  • O475