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Influences of Deposition Technologies on Stress-strain Properties of Thick Diamond Films

BAI Yi zhen1,2, LV Xian yi3, HAN Xue mei3, JIN Zeng sun3, LV Tian shan4, BAI Yuan5   

  1. 1.State Key Laboratory of Materials Modification by Laser, Ion and Electron Beams, Dalian University of Technology,Dalian 116023,Liaoning Province,China; 2.Department of Physics,Dalian University of Technology,Dalian 116023,Liaoning Province,China;3.State Key Laboratory of Superhard Materials,Jilin University,Changchun 130012,China;4.School of Business Administration, Changchun University of Technology,Changchun 130012,China;
  • Received:2005-11-24 Revised:1900-01-01 Online:2006-09-26 Published:2006-09-26
  • Contact: LV Xian yi

Abstract: This paper focuses on the influences of the discharge current and methane concentration on the stress-strain properties of Chemical Vapor Deposition (CVD) thick diamond films. This has laid good foundations for the promotions of the qualities, especially the mechanical properties of thick diamond films.

Key words: chemical vapor deposition, diamond films, stress-strain 

CLC Number: 

  • O484.5