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Accurate Resistivity Measurement with Van Der Pauw Method in DAC

WU Bao jia1,2, HAN Yong hao1   

  1. 1. State Key Laboratory of Superhard Materials, Jilin University, Changchun 130012, China;2. Department of Physics, College of Science, Yanbian University, Yanji 133002, Jilin Province, China
  • Received:2008-03-21 Revised:1900-01-01 Online:2008-09-26 Published:2008-09-26
  • Contact: HAN Yong hao

Abstract: Using finite element analysis, the authors studied the relative error of the van der Pauw method for resistivity measurement in diamond anvil cell (DAC). It was found that the electrode contact area is a key factor affecting the accuracy of the van der Pauw method for resistivity measurement. Always the relative error increases with the increase of contact area, and this is especially obvious for semiconductor samples. But whether the electrodes have point contacts or not, the van der Pauw method would provide accurate result so long as the ratio of sample thickness to its diameter is less than 0.45, and the ratio of the side length of electrode contact area to sample diameter is less than 0.1.

Key words: high-pressure, diamond anvil cell, van der Pauw, resistivity, finite element analysis

CLC Number: 

  • O521.21