Journal of Jilin University Science Edition
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GAO Lili, LI Songfei, CAO Tianfu, ZHANG Xue
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With a mixture of nitrogen and argon as sputtering gas and ZnO as target N doped ZnO films were prepared via radio frequency magnetron sputtering technique by changing the nitrogen flux. The nitrogen flux was controlled to be 0,8,20,32 mL/min, respectively, and the effect of nitrogen flux on the optical properties of ZnO∶N thin films was investigated. It was found that with the nitrogen flux increasing, the band gap decreased and the absorption band edge showed red shift. In the roomtemperature photoluminescence spectra, the nearbandedge emission peaks showed red shift. And the intensity ratio between the ultraviolet nearedge emission and the visible deep energy level emission reduced. The Raman peaks at 272,642 cm-1increased with the nitrogen flux increasing.
Key words: ZnO∶N film, sputtering gas, optical property
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GAO Lili, LI Songfei, CAO Tianfu, ZHANG Xue. Effect of Sputtering Gas on the Optical Properties of ZnO∶N Thin Films[J].Journal of Jilin University Science Edition, 2016, 54(01): 138-142.
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http://xuebao.jlu.edu.cn/lxb/EN/Y2016/V54/I01/138
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