Abstract: The FeN thin films were prepared on Si(100) and SrTiO3(100) single crystal substrates by DC magnetron sputtering, keeping the flow rate of argon unchanged, and controlling the volume fractions of nitrogen at 10%,12.5% and 15%, respectively. The structure and magnetic properties of FeN thin films grown on the different substrates were characterized by using Xray diffraction (XRD) and vibrating sample magnetometer (VSM) respectively. The results show that the singlephase γ′-Fe₄N thin films are obtained on the SrTiO₃(100) single crystal substrate. Oriented growth of the γ′-Fe₄N films  induced on SrTiO₃(100) substrate is easier than Si(100) substrate. When the volume fraction of nitrogen is about 12.5%, the crystallinity is better and the saturation magnetization is higher of the singlephase γ′-Fe₄N thin films, the coercivity is lower than that of the Fe_N thin films obtained on Si(100) substrate, and the soft magnetic properties are better.

Key words: Fe-N thin film, substrate, microstructure, magnetic property