J4 ›› 2011, Vol. 49 ›› Issue (01): 125-130.

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Structural and Magnetic Properties of FeCoN Thin Film Deposited by Facing-Target Magnetron Sputtering

JIA Hui1,2, HAN Li1, SUN Shu jing1, SUN Guang dong3, ZHAO Cui mei2, |WANG Xin2   

  1. 1. College of Physics, |Beihua |University, |Jilin |132013, Jilin Province, |China;2. College of Materials Science and Engineering, Jilin University, |Changchun |130012, China; 3. |Department of Electronics, Huizhou College, Huizhou 516007, Guangdong Province,   |China
  • Received:2010-01-27 Online:2011-01-26 Published:2011-02-19
  • Contact: WANG Xin E-mail:wang_xin@jlu.edu.cn

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Abstract:

Fe-Co-N films were deposited on an unheated Si (111) substrate by means of  developed facing\|target magnetron sputtering with N2/Ar  as sputtering gas.  The effect of various   Co target power on the structure, morphology and magnetic properties of FeCoN films were investigated by X-ray diffraction (XRD), transmission electron microscopy (TEM), scanning electron microscopy (SEM) and superconducting quantum interference device (SQUID), respectively. The results show that when  the input power on Fe target was 160   W and Co target power was 2.4 W, the thin films with ε-(Fe,Co)3N were synthesized; when Co target power was 58 W, paramagnetic Co3N phase appeared with ferromagnetic phase Fe3N,  saturation magnetization (Ms) of thin film is 151.47 A·m2/kg, coercivity (Hc) is 3.68 kA/m. When Co target power was  11.9 W (I=0.07 A),  
α″-Fe,Co)16N2 phase was obtained with a high Ms of 265.08 A·m2/kg and Hc of 8.24 kA/m.

Key words: FeCoN thin film, α″-Fe16N2, saturation magnetization, coercivity

CLC Number: 

  • TB303
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