吉林大学学报(工学版) ›› 2011, Vol. 41 ›› Issue (03): 782-786.

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Modeling and characterization of deep-submicron PD SOI MOSFET

TANG Wei,WU Long-sheng,LIU Cun-sheng,LIU You-bao   

  1. Department of Computer Research and Development,Xi’an Microelectronics Technology Institute,Xi’an 710054,China
  • Received:2009-06-30 Online:2011-05-01 Published:2011-05-01

Abstract:

Based on BSIM SOI model the self-heating effect, body contact effect and floating body effect of deep-submicron PD SOI MOSFET devices are investigated. The methods of modeling and parameter extraction of PD SOI MOSFET are developed. The above methods are applied to the devices fabricated in 0.35 μm PD SOI process in Xi'an Microelectronics Technology Institute. The extracted device model shows good agreement with experimental data, which validates the accuracy, effectiveness of the proposed methodology.

Key words: semiconductor technology, device modeling, BSIMSOI, partially depleted SOI(PD SOI), parameter extraction

CLC Number: 

  • TN303
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