吉林大学学报(理学版) ›› 2019, Vol. 57 ›› Issue (1): 156-160.

• 物理 • 上一篇    下一篇

不同基片生长γ′-Fe4N薄膜的结构及其磁学性能

刘伟达1,2, 陈蕊1, 王丽丽1, 李宏广1, 安涛1, 张东辉2, 徐士翀3
  

  1. 1. 长春大学 理学院, 长春 130022; 2. 核工业工程研究设计有限公司, 北京 101300;3. 吉林师范大学 功能材料物理与化学教育部重点实验室, 长春 130103
  • 收稿日期:2018-01-03 出版日期:2019-01-26 发布日期:2019-02-08
  • 通讯作者: 王丽丽 E-mail:ccdxwll@163.com

Structure and Magnetic Properties of γ′-Fe4NThin Films Grown on Different Substrates#br#

LIU Weida1,2, CHEN Rui1, WANG Lili1, LI Hongguang1, AN Tao1, ZHANG Donghui2, XU Shichong3#br#   

  1. 1. College of Science, Changchun University, Changchun 130022, China;2. Nuclear Industrial Engineering Research Design Co. Ltd, Beijing 101300, China;3. Key Laboratory of Functional Materials Physics and Chemistry of the Ministry of Education,Jilin Normal University, Changchun 130103, China
  • Received:2018-01-03 Online:2019-01-26 Published:2019-02-08
  • Contact: WANG Lil E-mail:ccdxwll@163.com

摘要: 采用直流磁控溅射方法, 保持氩气流量不变, 控制氮气的体积分数为10%,125%,15%, 分别用Si(100)单晶和SrTiO3(100)单晶基片制备FeN薄膜. 用X射线衍射(XRD)和振动样品磁强计(VSM)等方法对两种不同基片生长FeN薄膜的结构及磁学性能进行表征. 结果表明: 在SrTiO3(100)单晶基片上得到了单相γ′-Fe4N薄膜, 与Si(100)基片上的样品相比, SrTiO3(100)更有利于诱导γ′-Fe4N薄膜的取向性生长; 当氮气的体积分数约为12.5%时, 制备单相γ′-Fe4N薄膜的晶粒结晶度较好, 且饱和磁化强度较高, 矫顽力比Si(100)为基片获得的FeN薄膜样品低, 软磁性能较好.

关键词: Fe-N薄膜, 基片, 微观结构, 磁学性能

Abstract: The FeN thin films were prepared on Si(100) and SrTiO3(100) single crystal substrates by DC magnetron sputtering, keeping the flow rate of argon unchanged, and controlling the volume fractions of nitrogen at 10%,12.5% and 15%, respectively. The structure and magnetic properties of FeN thin films grown on the different substrates were characterized by using Xray diffraction (XRD) and vibrating sample magnetometer (VSM) respectively. The results show that the singlephase γ′-Fe4N thin films are obtained on the SrTiO3(100) single crystal substrate. Oriented growth of the γ′-Fe4N films  induced on SrTiO3(100) substrate is easier than Si(100) substrate. When the volume fraction of nitrogen is about 12.5%, the crystallinity is better and the saturation magnetization is higher of the singlephase γ′-Fe4N thin films, the coercivity is lower than that of the FeN thin films obtained on Si(100) substrate, and the soft magnetic properties are better.

Key words: Fe-N thin film, substrate, microstructure, magnetic property

中图分类号: 

  • O484.1