J4 ›› 2013, Vol. 51 ›› Issue (02): 301-304.

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Computer Simulation of the Early Growth of Cu Films

LIU Nan, ZHAO Chang chun, SUN Yao, WANG Xin, LI Ye, DUANMU Qing duo   

  1. School of Science, Changchun University of Science and Technology, Changchun 130022, China
  • Received:2012-03-26 Online:2013-03-26 Published:2013-03-27
  • Contact: WANG Xin E-mail:wangxin971241@yahoo.com.cn

Abstract:

Two-dimensional computer graphic simulation on the initial growth of Cu thin film was made based on Monte Carlo model. In this model, 100×100 two\|dimensional square lattice was established as the ideal substrate and the periodic boundary conditions were used. From  the simulation results, it was found that with the increase of the number of the deposited particles, the particle-cluster deposited on the substrate increased. It was also  found that with the increase of the migration step, the size and number of the cluster increased and the distribution became sparse when the temperature kept stable. In addition, the particles deposited assemble to the island with the increase of the temperature, the film was growing up   into island.

Key words: Monte Carlo model, Cu film, computer simulation

CLC Number: 

  • O484