Abstract:

A SiGe film was electrodeposited in ［EMIm］Tf2N ionic liquid. In order to study the reaction process of SiGe on electrode surface, cyclic voltammetry curves at different scan rates were determined. The microstructure and composition of the SiGe film were characterized by scanning electron microscopy and energy dispersive spectroscopy. An irreversible process of the codeposition of SiGe was controlled by diffusion in ［EMIm］Tf₂N ionic liquid. The
 cathodal transfer coefficient (α=0.175) and diffusion coefficient (D₀=6.64×10^{-7 }m/s) of an electrode reaction process of SiGe codeposition were calculated based on the cyclic voltmmetric curve.

Key words: ionic liquid, SiGe, codeposition, scan rate, cyclic voltammetry