吉林大学学报(工学版) ›› 2013, Vol. 43 ›› Issue (03): 836-840.doi: 10.7964/jdxbgxb201303046
姜文龙, 贾萍, 汪津, 丁桂英
JIANG Wen-long, JIA Ping, WANG Jin, DING Gui-ying
摘要: 讨论了采用热蒸镀方法制备的结构为ITO/β-NPB(55-x nm)/Alq3(45 nm)/TAZ(x nm)/LiF(0.5 nm)/Al的器件的磁效应.在室温下研究了x分别取0、5、10、15 nm时器件的电阻率与磁场之间的变化关系.结果表明,x=0 nm时,在10 V电压下,电阻率变化率Δρ/ρ随磁场强度的增大而增大;当磁场强度B=110 mT时,Δρ/ρ达到最大,仅为8.22%.当x分别取5、10、15 nm时,Δρ/ρ为随磁场的增大而减小;在相同磁场强度下,x越大,Δρ/ρ越大;当B=110 mT,x=15 nm,电压为10 V时,Δρ/ρ的数值达到最大,为-16.92%.
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